IT-1026
Positive Photo Resist Stripper
ST-1026 is a PR stripper which can be used in semiconductor manufacturing process, and it does not affect the surface roughness after etching, and excellently forms Al electrode membrane by removing PR. Additionally, ST-1026 does not cause the environmental issues as other halogenated solvents, and shows high solvency while getting rid of resin. Especially, ST-1026 shows 2~3 time better cleaning power compared to other solvents.
※ Principle of ST-1026 and pictures of stripping
| Before | After |
|---|---|
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[Features]
• Shows excellent removal speed on PR compared to other solvents
• No residue left after PR removal
• Does not damage material such as Si, GaAs, L/T, L/N wafer, sodalime glass, etc.
• Does not damage metal layers (Ni, Au, Ti, Al, ITO, Cr, etc.)
• Able to strip positive PR
• Applicable as PR stripper for lift off
[ Properties and method ]
| Appearance | Light yellow transparent liquid | Concentration | Original/undiluted |
|---|---|---|---|
| Odor | Unique odor | Temp. | 40 ~ 80 ℃ |
| pH(10%) | 11.5 ± 0.5 | Method | Dipping, dipping ultrasonic |
| S/G (g/ml) | 1.06 ± 0.02 | Packing | 20L (pail) / 200L (drum) |
[ Application ]
• Semiconductor, LCD, organic EL, etc.
