Metal Etchant
Cr-Ni Etchant
CT-1200S is a Cr-Ni etchant for formation of metal pattern by etching Cr-Ni layer for semiconductor and LED manufacturing process.
[Features]
• Strong acidic etchant which efficiently etches Cr layer without residue left
• Excellent oxiditzing power quickens etching rate.
• Suitable for micro-etching such as etching photo mask
• No undercuts made due to low reactivity to PR.
[CT-1200S Application]
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SUS Etchant
SB-219ST is an exclusive etchant for SUS which minimizes toxicity to human body, equipment and environment. SB-219ST is a neutral type etchant, and provides high quality surface by micro-etching SUS surface.
[Features]
• Provides outstanding gloss on surface and more convenient process condition compared to dry sand blast process
• Keeps clean surfaces since SB-219ST also removes oxide, scale, etc.
• Does not generate acid gas and no excessive corrosion occurs on material and equipment
[SB-219ST Application]
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Gold Etchant
AT-409 is an exclusive etchant for Au (gold) metalizing of semiconductor wafer. AT-409 is a neutral type etchant and shows no reactivity to other metal except gold, and it is usually used for pattern etching of semiconductor wafer.
[Features]
• Eco-friendly etchant which shows minimal effect to human body, equipment and environment
• AT-409 is a pattern etchant for semiconductor wafer, and shows minimum reactivity to other metal except gold.
• Provides excellent etching quality since no reside left after the process
• Etching rate can be controlled by adjustment of temperature and concentration.
[AT-409 Application]
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ITO Etchant
HD-113 is an exclusive etchant for ITO (Indium Tin Oxide) metalizing of semiconductor wafer. HD-113 is an acidic etchant and does not cause discoloration of wafer, nor damage to photo resist.
[Features]
• Does not cause damage on positive PR and negative PR of wafer
• HD-113 is an exclusive pattern etchant for wafer, and shows minimum reactivity to other metal.
• Provides excellent etching quality since no reside left after the process
• Etching rate can be controlled by adjustment of temperature and concentration.
[HD-113 Application]
| Before | after |
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Before – Residue left |
After – No residue left |
Al Etchant
DAC-107DZ is a surface treatment agent for aluminum which effectively removes oil and oxidized layer, and at the same time, provides even polish on the surface. DAC-107DZ is particularly suitable for micro-etching of aluminum surface, and excellently forms patterns without damage to photo resist.
[Features]
• Reduces costs of wastewater and toxic gas
• Vertical etching of aluminum is possible.
• Suitable for micro-etching; such as fine parts processing of electricity and electronics, automobile, and aircraft, etc.
• Increases value of products; provides outstanding polish and corrosion resistance after process.
• Can be used in room temperature
[DAC-107DZ Application]
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