CT-1200S
Cr, Ni Etchant
CT-1200S efficiently forms metal pattern by etching Cr-Ni layer in semiconductor and LED manufacturing process.
[Features]
• No residue left after etching
• Shows fast E/R with excellent oxidizing power
• Suitable for micro-etching such as photo mask, etc.
• No undercut forms since it has low reactivity to PR
[ Properties and method ]
| Appearance | Light yellow transparent liquid | Concentration | Original/undiluted |
|---|---|---|---|
| Odor | Light acid odor | Temp. | 20 ~ 40 ℃ |
| pH(10%) | 1.25 ± 0.5 | Method | Dipping, dipping ultrasonic |
| S/G (g/ml) | 1.10 ± 0.02 | Packing | 20L (pail) / 200L (drum) |
※ Solution management
1) Check the initial pH of the solution.
2) When the stripping power decreases, check the pH and add the adequate amount of the original solution.
3) When the solution has been aged due to the long term use, replace it with new solution.
[ Application ]
| Metal Photo Mask | Cr Glass |
|---|---|
 |
 |
※ Pictures of stripping
| Before Stripping | After Stripping |
|---|---|
 |
 |
