{"id":164,"date":"2018-04-13T10:39:49","date_gmt":"2018-04-13T01:39:49","guid":{"rendered":"http:\/\/wptest2.mir9.co.kr\/?page_id=164"},"modified":"2024-06-20T16:19:42","modified_gmt":"2024-06-20T07:19:42","slug":"metal-etchant","status":"publish","type":"page","link":"https:\/\/www.cychem.co.kr\/en\/business-introduction\/surface-treatment-agent\/metal-etchant\/","title":{"rendered":"Metal Etchant"},"content":{"rendered":"

Metal Etchant<\/p>\n<\/div><\/section>\n

Cr-Ni Etchant<\/p>\n<\/div><\/section>\n

CT-1200S<\/strong> is a Cr-Ni etchant for formation of metal pattern by etching Cr-Ni layer for semiconductor and LED manufacturing process.<\/p>\n<\/div><\/section>\n

[Features]<\/p>\n<\/div><\/section>\n

\u2022 Strong acidic etchant which efficiently etches Cr layer without residue left
\n\u2022 Excellent oxiditzing power quickens etching rate.
\n\u2022 Suitable for micro-etching such as etching photo mask
\n\u2022 No undercuts made due to low reactivity to PR.<\/p>\n<\/div><\/section>\n

[CT-1200S Application]<\/p>\n<\/div><\/section>\n

\n\n\n\n\n
Before<\/th>\nAfter<\/th>\n<\/tr>\n<\/thead>\n
\"\"<\/td>\n\"\"<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div><\/section><\/div>\r\n\r\n

SUS Etchant<\/p>\n<\/div><\/section>\n

SB-219ST<\/strong> is an exclusive etchant for SUS which minimizes toxicity to human body, equipment and environment. SB-219ST is a neutral type etchant, and provides high quality surface by micro-etching SUS surface.<\/p>\n<\/div><\/section>\n

[Features]<\/p>\n<\/div><\/section>\n

\u2022 Provides outstanding gloss on surface and more convenient process condition compared to dry sand blast process
\n\u2022 Keeps clean surfaces since SB-219ST also removes oxide, scale, etc.
\n\u2022 Does not generate acid gas and no excessive corrosion occurs on material and equipment<\/p>\n<\/div><\/section>\n

[SB-219ST Application]<\/p>\n<\/div><\/section>\n

\n\n\n\n\n
Before<\/th>\nafter<\/th>\n<\/tr>\n<\/thead>\n
\"\"<\/td>\n\"\"<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div><\/section><\/div>\r\n\r\n

Gold Etchant<\/p>\n<\/div><\/section>\n

AT-409<\/strong> is an exclusive etchant for Au (gold) metalizing of semiconductor wafer. AT-409 is a neutral type etchant and shows no reactivity to other metal except gold, and it is usually used for pattern etching of semiconductor wafer.<\/p>\n<\/div><\/section>\n

[Features]<\/p>\n<\/div><\/section>\n

\u2022 Eco-friendly etchant which shows minimal effect to human body, equipment and environment
\n\u2022 AT-409 is a pattern etchant for semiconductor wafer, and shows minimum reactivity to other metal except gold.
\n\u2022 Provides excellent etching quality since no reside left after the process
\n\u2022 Etching rate can be controlled by adjustment of temperature and concentration.<\/p>\n<\/div><\/section>\n

[AT-409 Application]<\/p>\n<\/div><\/section>\n

\n\n\n\n\n
Before<\/th>\nafter<\/th>\n<\/tr>\n<\/thead>\n
\"\"<\/td>\n\"\"<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div><\/section><\/div>\r\n\r\n

ITO Etchant<\/p>\n<\/div><\/section>\n

HD-113<\/strong> is an exclusive etchant for ITO (Indium Tin Oxide) metalizing of semiconductor wafer. HD-113 is an acidic etchant and does not cause discoloration of wafer, nor damage to photo resist.<\/p>\n<\/div><\/section>\n

[Features]<\/p>\n<\/div><\/section>\n

\u2022 Does not cause damage on positive PR and negative PR of wafer
\n\u2022 HD-113 is an exclusive pattern etchant for wafer, and shows minimum reactivity to other metal.
\n\u2022 Provides excellent etching quality since no reside left after the process
\n\u2022 Etching rate can be controlled by adjustment of temperature and concentration.<\/p>\n<\/div><\/section>\n

[HD-113 Application]<\/p>\n<\/div><\/section>\n

\n\n\n\n\n
Before<\/th>\nafter<\/th>\n<\/tr>\n<\/thead>\n
\"\"<\/p>\n

Before – Residue left<\/h4>\n<\/td>\n

\"\"<\/p>\n

After – No residue left<\/h4>\n<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div><\/section><\/div>\r\n\r\n

Al Etchant<\/p>\n<\/div><\/section>\n

DAC-107DZ<\/strong> is a surface treatment agent for aluminum which effectively removes oil and oxidized layer, and at the same time, provides even polish on the surface. DAC-107DZ is particularly suitable for micro-etching of aluminum surface, and excellently forms patterns without damage to photo resist.<\/p>\n<\/div><\/section>\n

[Features]<\/p>\n<\/div><\/section>\n

\u2022 Reduces costs of wastewater and toxic gas
\n\u2022 Vertical etching of aluminum is possible.
\n\u2022 Suitable for micro-etching; such as fine parts processing of electricity and electronics, automobile, and aircraft, etc.
\n\u2022 Increases value of products; provides outstanding polish and corrosion resistance after process.
\n\u2022 Can be used in room temperature<\/p>\n<\/div><\/section>\n

[DAC-107DZ Application]<\/p>\n<\/div><\/section>\n

\n\n\n\n\n
Before<\/th>\nafter<\/th>\n<\/tr>\n<\/thead>\n
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