{"id":162,"date":"2018-04-13T10:39:42","date_gmt":"2018-04-13T01:39:42","guid":{"rendered":"http:\/\/wptest2.mir9.co.kr\/?page_id=162"},"modified":"2018-04-30T15:03:46","modified_gmt":"2018-04-30T06:03:46","slug":"electrical-and-electronics-process-chemical","status":"publish","type":"page","link":"https:\/\/www.cychem.co.kr\/en\/business-introduction\/surface-treatment-agent\/electrical-and-electronics-process-chemical\/","title":{"rendered":"Electrical and Electronics Process Chemical"},"content":{"rendered":"

Electrical and Electronics Process Chemical<\/p>\n<\/div><\/section>\n

Positive PR Stripper<\/p>\n<\/div><\/section>\n

IT-1026<\/strong> was exclusively developed for photoresist stripping of wafer level packaging process of semiconductor, and is a high functional bulk PR stripper suitable for positive PR stripping.<\/p>\n<\/div><\/section><\/div>\r\n\r\n

[Features]<\/p>\n<\/div><\/section>\n

\u2022 Shows fast stripping speed compared to other solvents
\n\u2022 No residue left after PR stripping
\n\u2022 High functional bulk stripper for positive PR, and perfectly cleans without ash\/etch residue
\n\u2022 Excellently removes PR without damage or oxidation on bump metal or substrates
\n\u2022 Conditions of stripping process are flexible to change such as temperature, duration, etc<\/p>\n<\/div><\/section><\/div>\r\n\r\n

PR Etching Rate (PR Thickness : 5,30\u03bcm, Temp : 50 \u2103)<\/p>\n<\/div><\/section>\n

\n\n\n\n\n\n\n
PR Thickness<\/th>\n\u201cA\u201d Company<\/th>\n\u201cB\u201d Company<\/th>\nIT-1026<\/th>\n<\/tr>\n<\/thead>\n
E\/R for 5\u03bcm PR<\/td>\n0.4\u03bcm \/sec.<\/td>\n0.5\u03bcm \/sec.<\/td>\n0.6\u03bcm \/sec.<\/td>\n<\/tr>\n
E\/R for 30\u03bcm PR<\/td>\n0.8\u03bcm \/sec.<\/td>\n1.1\u03bcm \/sec.<\/td>\n1.3\u03bcm \/sec.<\/td>\n<\/tr>\n
PR Thickness<\/td>\n\u201cA\u201d Company<\/td>\n\u201cB\u201d Company<\/td>\nIT-1026<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div><\/section><\/div>\r\n\r\n

[IT-1026 Application]<\/p>\n<\/div><\/section>\n

\n\n\n\n\n
Before<\/th>\nafter<\/th>\n<\/tr>\n<\/thead>\n
\"\"<\/td>\n\"\"<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div><\/section><\/div>\r\n\r\n

Negative PR Stripper<\/p>\n<\/div><\/section>\n

IT-1030<\/strong> was exclusively developed for photoresist stripping of wafer level packaging process of semiconductor, and is a solvent type bulk PR stripper suitable for negative PR stripping.<\/p>\n<\/div><\/section><\/div>\r\n\r\n

[Features]<\/p>\n<\/div><\/section>\n

\u2022 IT-1030 was exclusively developed for PR stripping of wafer bumping.
\n\u2022 High functional bulk stripper for negative PR, and perfectly cleans without ash\/etch residue
\n\u2022 Excellently removes PR without damage or oxidation on bump metal or substrates
\n\u2022 Conditions of stripping process are flexible to change such as temperature, duration, etc.<\/p>\n<\/div><\/section><\/div>\r\n\r\n

Metal Etching Rate (\u00c5\/min.)<\/p>\n<\/div><\/section>\n

\n\n\n\n\n\n
Temp.<\/th>\nSiC<\/th>\nSiN<\/th>\nSiO2<\/th>\nTEOS<\/th>\nTi<\/th>\nTiN<\/th>\nW<\/th>\n<\/tr>\n<\/thead>\n
45\u2103<\/td>\n<1<\/td>\n<1<\/td>\n<1<\/td>\n<1<\/td>\n<1<\/td>\n<1<\/td>\n<1<\/td>\n<\/tr>\n
65\u2103<\/td>\n<1<\/td>\n<1<\/td>\n<1<\/td>\n<1<\/td>\n<1<\/td>\n<1<\/td>\n<1<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div><\/section><\/div>

[IT-1030 Application]<\/p>\n<\/div><\/section>\n

\n\n\n\n\n
Before(gold bumps)<\/th>\nAfter (50\u2103, 20min.)<\/th>\n<\/tr>\n<\/thead>\n
\"\"<\/td>\n\"\"<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div><\/section><\/div>","protected":false},"excerpt":{"rendered":"","protected":false},"author":2,"featured_media":0,"parent":29,"menu_order":4,"comment_status":"closed","ping_status":"closed","template":"template-page.php","meta":[],"_links":{"self":[{"href":"https:\/\/www.cychem.co.kr\/en\/wp-json\/wp\/v2\/pages\/162"}],"collection":[{"href":"https:\/\/www.cychem.co.kr\/en\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/www.cychem.co.kr\/en\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/www.cychem.co.kr\/en\/wp-json\/wp\/v2\/users\/2"}],"replies":[{"embeddable":true,"href":"https:\/\/www.cychem.co.kr\/en\/wp-json\/wp\/v2\/comments?post=162"}],"version-history":[{"count":4,"href":"https:\/\/www.cychem.co.kr\/en\/wp-json\/wp\/v2\/pages\/162\/revisions"}],"predecessor-version":[{"id":1168,"href":"https:\/\/www.cychem.co.kr\/en\/wp-json\/wp\/v2\/pages\/162\/revisions\/1168"}],"up":[{"embeddable":true,"href":"https:\/\/www.cychem.co.kr\/en\/wp-json\/wp\/v2\/pages\/29"}],"wp:attachment":[{"href":"https:\/\/www.cychem.co.kr\/en\/wp-json\/wp\/v2\/media?parent=162"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}